Chemical Deposition is the precipitation of a metal salt dissolved in a chemical solution. The metal salt is then combined with another metal while in the solution. One common use of chemical deposition in metal finishing is in the semiconductor industry.
Chemical Vapor Deposition (CVD) is one of the more common types of chemical deposition. The process allows the deposition of a conforming metal film which cannot be achieved through traditional metal finishing techniques. Very thin layers of metals can be deposited using atomic layer deposition, which is one variation of CVD. We see this process commonly used in the integrated circuit industry. Coatings of wear-resistant material such as nitrides and carbides can be deposited. Certain polymers can also be deposited where lubricity and protection from other elements is required.
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